Trion RIE/ICP Dry Etcher
The Trion etcher is load lock equipped and operated via a touch screen interface. The user may employ either RIE (Reactive Ion Etching) RF power applied at the sample stage or ICP (Inductively Coupled Plasma) RF power applied at the shower head above the sample stage. The system is configured to use both chlorinated and fluorinated gases to perform a wide variety of etch recipes. The system has been upgraded to allow operation at temperatures up to 150C. The following gasses are available for use on the Trion etcher: O2, H2, CH4, Ar, BCl3, Cl2, SF6, He and CF4.
PLEASE USE FOM FOR EQUIPMENT RESERVATIONS