Vistec EBPG5200 50/100 KV Key Features
- High current density Thermal Field Emission (TFE) gun
- Minimum Beam diameter 2.2nm at 100pAmps
- Exposure current range from 100pA to >200nA (with the ability to run this range of current without changing the final aperture)
- System can be run automatically in a course - fine mode of operation without the need for final aperture exchange which optimizes system throughput
- 125Mhz clock-rate
- 20bit Main DAC resolution
- Piece part to full 200mm wafer writing
- Z lift stage control allowing flexibility in the running of thick substrate samples and curved surfaces (Z axis can be changed over a 10mm range +/-1um)
- 2-D Mark Locate, allowing a wider range of marker types and negating the need for edge related mark detection