Nano3: Equipment By Category

facilities

Facility User Rates cleanroom floorplan personnel Courses

equipment

all equipment Back End Processing Dry Etching Ebeam Lithography Materials Characterization Metalization / Thin Film Deposition Metrology Photolithography Thermal Processing

access

UCSD Internal Users UC System Users Non-UC System External Users

Safety

Statement Evacuation Map Resources

Services

Fabrication and Characterization E-Beam Lithography Dicing Focused Ion Beam Microfluidics Transmission Electron Microscopy

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Equipment

	Equipment	Category	Room
	GDSII Editor PC	Ebeam Lithography	2400A
	GDSII Editor PC #2	Ebeam Lithography	1416
	Vistec EBPG 5200	Ebeam Lithography	1409