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Equipment
Name:
EVG620 Lithography/NIL System
Equipment Type:
Description:
EVG620NT Semi-automated Double Side Mask Alignment System
(up to 150mm, double side, manual handling)
- Broad band UV source
- Exposure modes: hard-, soft- and vacuum contact, proximity
- Separation distance 0-300 um adjustable via software
- Wafer size up to 100 mm, pieces down to 20 mm x 20 mm.
- Wafer thickness 0.1-10 mm (for top side configuration only)
- Mask size 7 inch x 7 inch, 5 inch x 5 inch or 4 inch x 4 inch.
- Semi automatic loading with mechanical prealignment on chuck
- Quick change of mask and chuck
- Tooling for soft UV-Nanoimprinting & Micro Contact Printing
Location
| Karl Suss MJB3 Mask Aligner | Karl Suss MA6 Mask Aligner | EVG620 Lithography/NIL System | |||||
PLEASE USE FOM FOR EQUIPMENT RESERVATIONS