Beneq TFS200 Atomic Layer Deposition
The Beneq TFS 200 system is an Atomic Layer Deposition (ALD) tool for thin film processing based on a hot wall, flow through type reaction chamber, which is integrated into a water-cooled cold wall outer vacuum chamber. It can be operated in thermal ALD mode or in plasma enhanced ALD mode. The system is capable of depositing a variety of oxides and nitrides with extraordinary conformality and precision film thickness control for thickness of up to ~100nm. Deposition temperature range is 25 - 500C. Substrates up to 200mm in diameter can be accommodated.
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