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Back End Processing
Dry Etching
Ebeam Lithography
Materials Characterization
Metalization / Thin Film Deposition
Metrology
Photolithography
Thermal Processing
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Fabrication and Characterization
E-Beam Lithography
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Equipment
Name:
Zeiss Sigma 500
Equipment Type:
Materials Characterization
Description:
0.8nm resolution at 15kV
1.6nm resolution at 1kV
2.9nm resolution at 0.2kV
Superb imaging of insulating/soft materials without metal coating
STEM Detector
Backscatter Detector
Field free electrostatic final lens
Magnetic materials OK
Location
1416
Device Characterization
Agilent B1500A Semiconductor Device Analyzer
Zeiss Sigma 500
Lindberg Mini-Mite Tube Furnace
UVO Cleaner
GDSII Editor PC #2
PLEASE USE FOM FOR EQUIPMENT RESERVATIONS