Nano3: Equipment

Name:

Vistec EBPG 5200

Equipment Type:

Ebeam Lithography

Description:

High-resolution Gaussian Beam System
Thermal Field Emission source with 50/100kV beam energy
Minimum feature size <8nm
Write field size up to 1mm; stitching <30nm (mean + 3 sigma)
Sample holders: 2”, 3”, 4”, 8” wafers and pieces, 6” mask

Please visit http://nano3.calit2.net/ebeamlitho for more information.

E-beam Lithography

					Vistec EBPG 5200
	Filmetrics F20 (2)	Zeiss Axio Imager Optical Microscope			Vistec EBPG 5200

PLEASE USE FOM FOR EQUIPMENT RESERVATIONS