Idonus HF VPE-150 is a hydrofluoric acid vapor phase etcher. It consists of a reaction chamber and a lid. A heating element is integrated in the lid. It controls the temperature of the substrate to be etched. Liquid HF is filled into the reaction chamber. The reaction chamber is closed with the lid. The HF vapor is created at room temperature and the etching process starts spontaneously. The etch rate is controlled by the wafer temperature that can be adjusted from 35°C to 60 °C. An electrostatic clamping mechanism is integrated in the lid, samples of sizes from 2cm x 2cm pieces to full 150 mm wafers can be mounted on the lid directly.
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